high-performance critical dimensional measurement system.
The VIEW MicroLine® is a high-performance critical dimensional measurement system for wafers, masks, MEMS and other micro-fabricated devices in situations which do not require fully automated operation.
MicroLine systems feature the highest quality microscope optics, motorized autofocus, manually operated stages and fully programmable illumination and measurement recipes. Reflected illumination is standard and transmitted illumination is available as an option. MicroLine systems are capable of measuring bright and dark lines, semi-transparent layers, lines with irregular edges and other critical features.
MicroLine 1000 100 x 100 x 175 mm
MicroLine 2000 200 x 200 x 175 mm
MicroLine 3000 300 x 300 x 145 mm
Objective Lenses (Field Interchangable)
5X BF or BF/DF
10X BF or BF/DF
20X LWD, BF or BF/DF
100X LWD, BF or BF/DF
150X LWD, BF or BF/DF
Olympus Microscope optics, including horizontal bright field/dark field illuminator, five-objective manual lens turret with DIC slot, tilt trinocular viewing system with optical crosshair, and standard 0.63X back tube with camera mount
The MicroLine systems are well suited to measure wafers, masks, MEMS, and other micro-fabricated parts. These capable desktop instruments provide precise optical measurement for features as small as 0.5 microns on parts up to 300 x 300 mm. With its advanced lighting and optics, the MicroLine boasts robust capabilities for measuring transparent layers, lines with irregular edges, and more.